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| The size effects of inclusions on laser induced film damage | |
Han, Jinghua1; Li, Yaguo2; Fan, Weixing1; He, Changtao3 ; Wang, Pingqiu4; Niu, Ruihua4; Feng, Guoying1; Liu, Quanxi4
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| 2013-09-01 | |
| Source Publication | JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS
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| Volume | 15Issue:9-10Pages:943-947 |
| Contribution Rank | 3 |
| Abstract | The damage of thin films due to inclusions can be caused by thermal accumulation, interference of scattered light with the incident laser beam and laser induced plasma. The synergic effects of these three mechanisms determine the damage characteristics of optical thin films, each of which is related to the size of inclusions in thin films. Our research results show that the films are damaged owing to the localized interference of light and the melting of thin films when the radii of inclusion particles lie within 24 nm and 40 nm. The laser-induced plasma resulting from the evaporation and ionization of thin film material will be generated when the radii of inclusion particles are larger than 40 nm. Those smaller than 24 nm, can be regarded as safe and free from inducing damage. |
| Keyword | Laser-induced Damage Inclusion Thermal Effect Scattering Laser Plasma |
| Subtype | Article |
| WOS Headings | Science & Technology ; Technology ; Physical Sciences |
| Indexed By | SCI |
| Language | 英语 |
| WOS Keyword | CONTAMINATION PARTICLES ; MULTILAYER COATINGS ; FUSED-SILICA ; THIN-FILMS ; SURFACE ; THRESHOLD ; ABLATION ; DEFECTS ; PULSES ; NM |
| WOS Research Area | Materials Science ; Optics ; Physics |
| WOS Subject | Materials Science, Multidisciplinary ; Optics ; Physics, Applied |
| WOS ID | WOS:000326414700004 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.xao.ac.cn/handle/45760611-7/489 |
| Collection | 计算机技术应用研究室 |
| Affiliation | 1.Sichuan Univ, Sch Elect & Informat Engn, Chengdu 610064, Peoples R China 2.Fine Opt Engn Res Ctr, Chengdu 610041, Peoples R China 3.Chinese Acad Sci, XinJiang Astron Observ, Urumqi 830011, Peoples R China 4.Southwest Inst Tech Phys, Chengdu 610041, Peoples R China |
| Recommended Citation GB/T 7714 | Han, Jinghua,Li, Yaguo,Fan, Weixing,et al. The size effects of inclusions on laser induced film damage[J]. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS,2013,15(9-10):943-947. |
| APA | Han, Jinghua.,Li, Yaguo.,Fan, Weixing.,He, Changtao.,Wang, Pingqiu.,...&Liu, Quanxi.(2013).The size effects of inclusions on laser induced film damage.JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS,15(9-10),943-947. |
| MLA | Han, Jinghua,et al."The size effects of inclusions on laser induced film damage".JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 15.9-10(2013):943-947. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| The size effects of （272KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-ND | View Application Full Text | |
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